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Mirror 650-1300 nm Imaging

F29-650
€477.00 *
Content: 1 Pieces

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Delivery time appr. 6–10 weeks

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  • F29-650
Reflection > 98% 650 – 1300 nm Reflection (s-pol) > 99.5% 650 – 1300 nm Reflection (p-pol) >... more
Product information "Mirror 650-1300 nm Imaging"
Reflection > 98% 650 – 1300 nm
Reflection (s-pol) > 99.5% 650 – 1300 nm
Reflection (p-pol) > 96% 650 – 1300 nm
Dimension 25,2 x 35,6 x 1,1 mm
Related links to "Mirror 650-1300 nm Imaging"
Technical DataMehr anzeigen

Specifications

Order-No.: MGP01-650-1300-25x36
Reflection Band 1: Ravg > 98% 650 - 1300 nm
Reflection Band 1 (p-pol): Ravg > 96% 650 - 1300 nm
Reflection Band 1 (s-pol): Ravg > 99.5% 650 - 1300 nm
Reflection Band 2: Ravg > 98% 650 - 1300 nm
Angle of Incidence: 45.0 ± 1.5 degrees
Optical Damage Rating: Testing has proven to show no signs of degradation when exposed to at least 6.0 W of power from an unfiltered xenon arc lamp over a 25 mm diameter (corresponding to 1.2 W/cm2) for over 500 hrs.
Substrate type: low-autofluorescence optical quality glass
Flatness / RWE Classification: Image-splitting
Reflected Wavefront Error: < 2λ P-V RWE @ 632.8 nm
Transverse Dimensions (L x W): 25.2 mm x 35.6 mm
Transverse Tolerance: ± 0.1 mm
Filter Thickness (unmounted): 1.05 mm
Filter Thickness Tolerance (unm: ± 0.05 mm
Clear Aperture: ≥ 80% (elliptical)
Scratch-Dig: 60-40
Substrate thickness: 1.05 mm
Orientation: Reflective surface marked with part number - Orient in direction of incoming light
Other physical specs: Standard Specifications of Our Filters and Beam Splitters
Warranty: 10 years
Dimensions: 25,5 x 36 mm
Free aperture : >= 80% (elliptical)
Scratch-Dig: 60-40
Substrate thickness: 1,05 mm
Flatness: < 2 lambda P/V RWE