Quad Strahlenteiler HC 410/504/582/669
Produktinformationen "Quad Strahlenteiler HC 410/504/582/669"
AOI 45°
Abmessung 25,2 x 35,6 x 1,1 mm
Abmessung 25,2 x 35,6 x 1,1 mm
Spezifikationen
| OEM-/Originalnummer: | FF410/504/582/669-Di01-25x36 |
|---|---|
| Reflection Band 1: | Ravg > 95% 381.5 - 392.5 nm |
| Edge Wavelength 1: | 410 nm |
| Transmission Band 1: | Tavg > 90% 420 - 460 nm |
| Reflection Band 2: | Ravg > 95% 475 - 495 nm |
| Edge Wavelength 2: | 504 nm |
| Transmission Band 2: | Tavg > 90% 510 - 531 nm |
| Reflection Band 3: | Ravg > 95% 547 - 572 nm |
| Edge Wavelength 3: | 582 nm |
| Reflection Band 4: | Ravg > 95% 643 - 656 nm |
| Transmission Band 3: | Tavg > 90% 589.5 - 623.5 nm |
| Edge Wavelength 4: | 669 nm |
| Transmission Band 4: | Tavg > 90% 677 - 722 nm |
| Angle of Incidence: | 45 ± 1.5 degrees |
| Cone Half-angle: | 2 degrees |
| Optical Damage Rating: | Testing has proven to show no signs of degradation when exposed to at least 6.0 W of power from an unfiltered xenon arc lamp over a 25 mm diameter (corresponding to 1.2 W/cm2) for over 500 hrs. |
| Steepness: | Standard |
| Filter Effective Index: |
1.8 Understanding `Effective Index of Refraction` neff |
| Substrate type: | low-autofluorescence optical quality glass |
| Flatness / RWE Classification: | Standard Epi-fluorescence |
| Reflected Wavefront Error: | >> 6λ P-V RWE @ 632.8 nm |
| Transverse Dimensions (L x W): | 25.2 mm x 35.6 mm |
| Transverse Tolerance: | ± 0.1 mm |
| Filter Thickness (unmounted): | 1.05 mm |
| Filter Thickness Tolerance (unm: | ± 0.05 mm |
| Clear Aperture: | ≥ 80% (elliptical) |
| Scratch-Dig: | 60-40 |
| Substrate thickness: | 1.05 mm |
| Orientation: | Reflective surface marked with part number - Orient in direction of incoming light |
| Other physical specs: | Standard Specifications of Our Filters and Beam Splitters |
| Abmessungen: | 25.2 mm x 35.6 mm |
| Anzahl Bänder/Kanten/Notch: | 4 |
| Art des Strahlenteilers: | Multiband |
| Garantie: | 10 Jahre |
| Kantensteilheit: | Standard für Fluoreszenz |
| Anwendung (bs): | Epifluoreszenz |
| CWL/EdgeWL/NotchWL (nm): | 410, 504, 582, 669 |
| geeignet für: | Epi-Fluoreszenz |
| Substratdicke: | 1 mm |
| Damage Threshold: | no signs of degradation acc. to testing |
| Scratch-Dig: | 60-40 |